Photoresist Technology in Microsystems: Principles, Processes and Applications - Kaiying Wang
English | 2025 | 195 Pages | ISBN: 9819516056 | PDF EPUB (True) | 30.26 MB
This book presents a comprehensive overview of recent advances in photoresist technology, a cornerstone of modern microfabrication. Photoresists enable the precise patterning essential for creating microelectronic devices, MEMS, biomedical systems, and photonic components. As the demand for smaller, faster, and more efficient microsystems grows, the role of photoresists in achieving high-resolution patterning and complex 3D structures has become increasingly critical. However, despite its importance, there is a lack of comprehensive resources that bridge the gap between the fundamental principles of photoresist chemistry, advanced fabrication techniques, and their diverse applications.