"Lithography" ed. by Michael Wang

This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field.

Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits.

Contents
Preface
Contents
Advanced Photolithography
1 Direct Laser Lithography and Its Applications
2 High Aspect Ratio Sloping and Curved Structures Fabricated by Proximity and UV-LED Backside Exposure
3 Influence of Immersion Lithography on Wafer Edge Defectivity
4 Femtosecond Laser Nonlinear Lithography
5 Improving the Efficiency of Pattern Extraction for Character Projection Lithography using OPC Optimization
6 Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities
7 Advances in Resist Materials and Processing Technology: Photonic Devices Fabricated by Direct Lithography of Resist/Colloidal Nanocrystals Blend
8 A Method for Optical Proximity Correction of Thermal Processes: Orthogonal Functional Method
EUV and X-Ray Lithography
9 C02 Laser Produced Tin Plasma Light Source as the Solution for EUV Lithography
10 Grazing Incidence Mirrors for EUV Lithography
11 Steady-state and Time-dependent LPP Modeling
12 Nano-crystalline Diamond Films for X-ray Lithography Mask
E-Beam and Ion Beam Lithography
13 High-energy Electron Beam Lithography for Nanoscale Fabrication
14 Optimal Design and Fabrication of Fine Diffractive Optical Elements Using Proximity Correction with Electron-beam Lithography
15 Independent-exposure Method in Electron-beam Lithography
16 The Interdependence of Exposure and Development Conditions when Optimizing Low-Energy EBL for Nano-Scale Resolution
17 Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 1: Exposure Modeling at Electron and Ion Beam Lithography
18 Computer Simulation of Processes at Electron and Ion Beam Lithography, Part 2: Simulation of Resist Developed Images at Electron and Ion Beam Lithography
Soft Lithography
19 Soft Lithographic Fabrication of Micro Optic and Guided Wave Devices
20 Application of Soft Lithography for Nano Functional Devices
21 Fabrication of SiC-based Ceramic Microstructures from Preceramic Polymers with Sacrificial Templates and Softlithography Techniques
22 Soft Lithography, a Tool to Address Single-Objects Investigations
Nanoimprint Lithography
23 Nanoimprint Lithography
24 Nanoimprint Lithography
25 Effect of Applying Ultrasonic Vibration in Hot Embossing and Nanoimprint
26 Molecular Dynamics Study on Mold and Pattern Breakages in Nanoimprint Lithography
27 Three Dimensional Nanoimprint Lithography using Inorganic Electron Beam Resist
28 Three-Dimensional Patterning using Ultraviolet Nanoimprint Lithography
Plasmonic Lithography and Nano Patterning
29 Metal Particle-Surface System for Plasmonic Lithography
30 Nanosphere Lithography for Nitride Semiconductors
31 Micro- and Nanopatterning of Surfaces Employing Self Assembly of Nanoparticles and Its Application in Biotechnology and Biomedical Engineering
32 Strategies for High Resolution Patterning of Conducting Polymers