"Ion Beams in Materials Processing and Analysis" by Bernd Schmidt, Klaus Wetzig

A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated.

Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly.
The ion beam is an important tool for both materials processing and analysis.

Contents
Preface
1: Introduction
2: Ion-Solid Interactions
2.1 Fundamental Principles
2.2 Binary Elastic Collisions
2.3 Ion Stopping
2.4 Ion Channeling
2.5 Ion Induced Target Modifications
References
3: Ion Beam Technology
3.1 Principles of Ion Acceleration
3.2 Ion Sources
3.3 Ion Acceleration
3.4 Ion Beam Handling
3.5 Ion Implantation Systems
3.6 Electrostatic Ion Accelerator Systems
3.7 Focused Ion Beam Systems
References
4: Materials Processing
4.1 Ion Irradiation Effects in Crystalline Materials
4.2 Ion Implantation into Semiconductors
4.3 Ion Beam Synthesis of New Phases in Solids
4.4 Ion Beam Mixing of Interfaces
4.5 Ion Beam Slicing of Thin Layers (Smart-Cut for SOI and Solar Cells)
4.6 Ion Beam Erosion, Sputtering, and Surface Patterning (Ripples and Dots)
4.7 Ion Beam Shaping of Nanomaterials
4.8 Ion Beam Processing of Other Materials
References
5: Ion Beam Preparation of Materials
5.1 Removal of Target Atoms by Sputtering
5.2 Effects on Sputtering Yield
5.3 Preparation Steps by Ion Beam Irradiation
5.4 Focused Ion Beam Preparation
References
6: Materials Analysis by Ion Beams
6.1 Introduction
6.2 Ion Beam Analytical Techniques: A Survey
6.3 Ion Beam-Scattering Techniques
6.4 Ion Beam-Induced Photon Emission
6.5 Nuclear Reaction Analysis
6.6 Ion Beam-Induced Electron and Light Emission
6.7 Secondary Ion Emission
6.8 Ion Beam Imaging Techniques
References
7: Special Ion Beam Applications in Materials Analysis Problems
7.1 Functional Thin Films and Layers
7.2 Ion Beam Analysis in Art and Archeometry
7.3 Special Applications in Life Sciences
References
Index

About the Author
Bernd Schmidt received his PhD in Physics at the State University of St. Petersburg (Russia) in 1976. Since 1994 he has been head of the Process Technology Division at the Helmholtz-Zentrum Dresden-Rossendorf, Germany. His research interests include semiconductor technology as well as ion implantation and the synthesis of nanostructures. He is author of the specialist book "Silicon Sensors" (1986) and of more than 150 refereed journal papers. Klaus Wetzig received his PhD (1967) and postdoctoral (1973) degrees in Physics at the TU Dresden, Germany. From 1992 until his retirement in 2006 he was full professor of Materials Analysis at the TU Dresden and research director at the Leibniz Institute for Solid State and Materials Research Dresden (IFW). His research interests include materials analysis, nanostructures and particle-solid interactions. He is author of several specialist books and of more than 300 refereed journal papers