"Chemical Vapor Deposition for Nanotechnology" ed. by Pietro Mandracci

Some of the most recent applications of chemical vapor deposition (CVD) techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented.


Contents
1.Spatial Atomic Layer Deposition
2.Direct Liquid Injection Chemical Vapor Deposition
3.DLC Layers Created Using CVD Techniques and Their Application
4.Controlled Post-treatment of Thick CVD-Diamond Coatings by High-Density Plasma Oxidation
5.Large-Area Synthesis and Growth Mechanism of Graphene by Chemical Vapor Deposition
6.Atmospheric Pressure Chemical Vapor Deposition of Graphene
7.Chemical Vapor Deposition of Helical Carbon Nanofibers