Theory and Application of Laser Chemical Vapor Deposition
Theory and Application of Laser Chemical Vapor Deposition By Jyoti Mazumder, Aravinda Kar (auth.)
1995 | 396 Pages | ISBN: 1489914323 | PDF | 11 MB
1995 | 396 Pages | ISBN: 1489914323 | PDF | 11 MB
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.