Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applicatons by Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen and Arthur Sherman
English | 2013 | ISBN: 1118062779 | 272 pages | PDF | 3,3 MB
English | 2013 | ISBN: 1118062779 | 272 pages | PDF | 3,3 MB
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective.
It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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