"Complementary Metal Oxide Semiconductor" ed. by Kim Ho Yeap, Humaira Nisar

In this book, Complementary Metal Oxide Semiconductor ( CMOS ) devices are extensively discussed. The book is intended to provide information on the latest technology development of CMOS to researchers, physicists, as well as engineers working in the field of semiconductor transistor manufacturing and design.

The topics encompass the technology advancement in the fabrication process of metal oxide semiconductor field effect transistors or MOSFETs (which are the fundamental building blocks of CMOS devices) and the applications of transistors in the present and future eras.

Contents
1 Introductory Chapter: Complementary Metal Oxide Semiconductor (CMOS)
2 Advanced Transistor Process Technology from 22- to 14-nm Node
3 Work Function Setting in High-k Metal Gate Devices
4 Selective Epitaxy of Group IV Materials for CMOS Application
5 MOS Meets NEMS: The Born of Hybrid Devices
6 Comprehensive Analytical Models of Random Variations in Subthreshold MOSFET's High-Frequency Performances
7 6T CMOS SFIAM Stability in Nanoelectronic Era: From Metrics to Built-in Monitoring
8 Towards New Generation Power MOSFETs for Automotive Electric Control Units