"Very-Large-Scale Integration" ed. by Kim Ho Yeap and Humaira Nisar
"Very-Large-Scale Integration" ed. by Kim Ho Yeap and Humaira Nisar
ITExLi | 2018 | ISBN: 9535138634 9789535138631 9535138642 9789535138648 9535139789 9789535139782 | 143 pages | PDF | 14 MB
ITExLi | 2018 | ISBN: 9535138634 9789535138631 9535138642 9789535138648 9535139789 9789535139782 | 143 pages | PDF | 14 MB
In this book, a variety of topics related to Very-Large-Scale Integration (VLSI) is extensively discussed.
The topics encompass the physics of VLSI transistors, the process of integrated chip design and fabrication and the applications of VLSI devices. It is intended to provide information on the latest advancement of VLSI technology to researchers, physicists as well as engineers working in the field of semiconductor manufacturing and VLSI design.
Contents
1 Introductory Chapter: VLSI
2 Transistor Degradations in Very Large-Scale-Integrated CMOS Technologies
3 Low Power Design Methodology
4 High-purity Refractory Metals for Thin Film Metallization of VLSI
5 Operational Amplifier Design in CMOS at Low-Voltage for Sensor Input Front-End Circuits in VLSI Devices
6 Design of High-Order CMOS Analog Notch Filter with 0.18 μm CMOS Technology
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